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Structure-property relationships in non-epitaxial chalcogenide heterostructures: the role of interface density on charge exchange

机译:在non-epitaxial组织性能的关系硫族化物异质结构:所扮演的角色在电荷交换接口密度

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A homologous series of quasi-2D ([PbSe](1+delta))(m)(TiSe2)(m) nanolayered heterostructures are prepared via self-assembly of designed precursors with 1 <= m <= 4 and their structures and properties investigated. All heterostructures have the same global composition but vary in their interface density. X-ray diffraction and electron microscopy studies show that the structures consist of rock salt structured PbSe layers alternating with TiSe2 layers, and that grain size increases with m. The compounds are all metallic with upturns in resistivity at low temperature suggesting electron localization, with room temperature resistivity of 1-3 10(-5) Omega m, negative Hall coefficients and Seebeck coefficients between -50 and -100 mu V K-1. A decrease in the mobile carrier concentration with temperature is observed for all m and the rate increases with increasing low-dimensionality. Decreasing the interface density also decreases the average carrier concentration while increasing the electron mobility. The Seebeck coefficients systematically increase in magnitude as m is increased, but the net effect to the power factor is small due to a compensating increase in resistivity. The observed transport behavior is not described by the simple rigid band models with charge transfer between constituents used previously. Charge exchange between constituents stabilizes the intergrowth, but also introduces mobile carriers and interfacial band bending that must play a role in the transport behavior of the heterostructures. As chemical potentials equilibrate in high m heterostructures there is a decrease in total coulombic stabilization as there are fewer interfaces, so m = 1 is likely to be most stable. This rationalizes why the structurally similar misfit layer compounds with m = 1 are often the only intergrowths that can be prepared. Charge transfer and band bending at interfaces should occur in other heterostructures with similar type II broken-gap band alignments and are important considerations regarding both their stability and transport properties.
机译:quasi-2D同源系列异质结构准备通过自组装设计前体1 < = m < = 4和他们结构和性质研究。异质结构有相同的全球组成但在界面密度不同。衍射和电子显微镜研究表明这个结构包含岩盐结构化的硒化铅层与TiSe2交替层,晶粒尺寸随米。化合物都是金属与上升电阻率较低温度显示电子定位,室温10(5) 1 - 3ω的电阻率,负的大厅系数和塞贝克系数在-50年和-100μV k - 1。载体浓度和温度观察m和加息增加低维。界面密度也降低了平均水平载体浓度而增加电子迁移率。系统地增加在m级增加,但净影响功率因数小是由于增加补偿电阻率。不是简单的刚性带模型所描述的成分之间的电荷转移之前。稳定的共生,还介绍了移动运营商和界面的能带弯曲必须在运输中发挥作用的行为吗异质结构。m异质结构有一个平衡总库仑稳定下降有更少的接口,所以m = 1的可能是最稳定的。结构相似的化合物与不合群层m = 1往往是唯一可以共生准备。接口应该发生在其他异质结构具有类似II型broken-gap乐队比对和是重要的考虑因素其稳定性和传输特性。

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