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Stabilization of Interfacial Polarization and Induction of Polarization Hysteresis in Organic MISIM Devices

机译:有机含义装置中界面极化抗透偏振和抗偏振滞后的稳定性

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摘要

Molecule-based ferroelectrics has attracted much attention because of its advantages, such as flexibility, light weight, and low environmental load. In the present work, we examined an organic metal|insulator|semiconductor|insulator|metal (MISIM) device structure to stabilize the interfacial polarization in the S layer and to induce polarization hysteresis even without bulk ferroelectrics. The MISIM devices with I = parylene C and S = TMB (=3,3′,5,5′-tetramethylbenzidine)-TCNQ (=tetracyanoquinodimethane) exhibited hysteresis loops in the polarization–voltage (P –V ) curves not only at room temperature but also over a wide temperature range down to 80 K. The presence of polarization hysteresis for MISIM devices was theoretically confirmed by an electrostatic model, which also explained the observed thickness dependence of the I layers on the P –V curves. Polarization hysteresis curves were also obtained in MISIM devices using typical organic semiconductors (ZnPc, C_(60), and TCNQ) as the S layer, demonstrating the versatility of the interfacial polarization mechanism.
机译:分子铁电体因其柔性、重量轻、环境负荷低等优点而备受关注。在目前的工作中,我们研究了一种有机金属|绝缘体|半导体|绝缘体|金属(MISIM)器件结构,以稳定S层中的界面极化,并在没有大块铁电体的情况下诱导极化滞后。具有I=parylene C和S=TMB(=3,3′,5,5′-四甲基联苯胺)-TCNQ(=四氰基喹二甲烷)的MISIM器件不仅在室温下,而且在低至80 K的宽温度范围内,在极化-电压(P-V)曲线中显示出迟滞回线,这也解释了观察到的I层厚度依赖于P–V曲线。在MISIM器件中,使用典型的有机半导体(ZnPc、C_60和TCNQ)作为S层,也获得了极化滞后曲线,证明了界面极化机制的通用性。

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