首页> 外文期刊>Journal of the European Ceramic Society >Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications
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Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications

机译:用于隔热应用的原子层沉积钇稳定氧化锆(YSZ)薄膜的低导热率

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摘要

Thermal insulation applications have long required materials with low thermal conductivity, and one example is yttria (Y2O3)-stabilized zirconia (ZrO2) (YSZ) as thermal barrier coatings used in gas turbine engines. Although porosity has been a route to the low thermal conductivity of YSZ coatings, nonporous and conformal coating of YSZ thin films with low thermal conductivity may find a great impact on various thermal insulation applications in nanostructured materials and nanoscale devices. Here, we report on measurements of the thermal conductivity of atomic layer deposition-grown, nonporous YSZ thin films of thickness down to 35 nm using time-domain thermoreflectance. We find that the measured thermal conductivities are 1.35-1.5 W m(-1) K-1 and do not strongly vary with film thickness. Without any reduction in thermal conductivity associated with porosity, the conductivities we report approach the minimum, amorphous limit, 1.25 W m(-1) K-1, predicted by the minimum thermal conductivity model. (C) 2017 Elsevier Ltd. All rights reserved.
机译:隔热应用长期以来要求材料具有低导热性,一个例子是钇(Y2O3)-稳定氧化锆(ZrO2)(YSZ)作为燃气轮机发动机中使用的热障涂层。尽管多孔性是YSZ涂层低导热性的一条途径,但低导热性YSZ薄膜的无孔保形涂层可能会对纳米结构材料和纳米器件中的各种隔热应用产生重大影响。在这里,我们报告了使用时域热反射法测量原子层沉积生长的厚度小于35nm的无孔YSZ薄膜的热导率。我们发现,测得的热导率为1.35-1.5 W m(-1)K-1,且不随薄膜厚度变化很大。在不降低与孔隙度相关的热导率的情况下,我们报告的热导率接近最小无定形极限1.25 W m(-1)K-1,由最小热导率模型预测。(C) 2017爱思唯尔有限公司版权所有。

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