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首页> 外文期刊>Surface Engineering >Electrochemical characteristics of iridium coating by double glow plasma discharge process on titanium alloy substrates
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Electrochemical characteristics of iridium coating by double glow plasma discharge process on titanium alloy substrates

机译:钛合金基材双辉光等离子体放电工艺铱涂层的电化学特性

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Iridium coating was fabricated by a double glow plasma discharge process on titanium alloy substrates. The electrochemical behaviours of the coating and the substrate were studied and compared. The coating exhibited a preferred (220) orientation. The coating was rough and many defects were present in the coating;;the electrochemical activity of the coating was strong. The corrosion potential of the coating was more positive than that of the substrate, and corrosion current density of the coating was higher than that of the substrate. Although the polarisation resistance of the coating was less than that of the substrate due to the defects in the coating and the performance of the oxide film formed, such as conductive Ir oxides film and non-conductive ceramic oxide film on the substrate surface, the coating with a high corrosion potential and high width of the capacitive loop had significant benefit for anti-corrosive properties of titanium alloy substrate.
机译:采用双辉光等离子体放电技术在钛合金基体上制备了铱涂层。研究并比较了涂层和基体的电化学行为。涂层呈现出优选(220)取向。涂层粗糙,存在许多缺陷;;涂层的电化学活性很强。涂层的腐蚀电位高于基体,腐蚀电流密度高于基体。尽管由于涂层中的缺陷和所形成的氧化膜的性能,例如基底表面上的导电红外氧化膜和非导电陶瓷氧化膜,涂层的极化电阻小于基底的极化电阻,具有高腐蚀电位和高电容环宽度的涂层对钛合金基体的抗腐蚀性能有显著的好处。

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