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首页> 外文期刊>Journal of Molecular Structure >Molecular structure aspects and molecular reactivity of some triazole derivatives for corrosion inhibition of aluminum in 1 M HCl solution
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Molecular structure aspects and molecular reactivity of some triazole derivatives for corrosion inhibition of aluminum in 1 M HCl solution

机译:一些三唑衍生物在1M HCl溶液中耐铝腐蚀抑制的分子结构方面和分子反应性

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摘要

The corrosion inhibition of three triazole derivatives; p-tolyl-1H-1,2,3-triazol-5-ol (Z1), 4-Chlorophenyl-1H-1, 2, 3-triazol-5-ol (Z2) and Methyl-4-(5-hydroxy-1H-1, 2, 3-triazol-1-yl) benzoate (Z3) towards aluminum metal in 1.0 M HCl have been investigated using potentiodynamic polarization (PDP), electro-chemical impedance spectroscopy (EIS), scanning electron microscopy (SEM), B3LYP Density Functional Theory (DFT) and adsorption annealing simulations. The electrochemical findings exhibit an inhibition efficiency increase in the order: Z3 > Z2 > Z1 with a maximum inhibition efficiency (74.7%) obtained at 500 ppm from Z3. Both anodic (beta a) and cathodic (beta c) Tafel constants was significantly affected by adding inhibitors to the corrosion medium proposing a mixed type nature. The adsorption of the inhibitors on the metal surface was found to be a spontaneous process and obeyed Langmuir isotherm. The conformational scan along with annealing adsorption simulations showed a dihedral angle between the triazole ring and the phenyl ring of only 30 degrees which promotes optimal surface coverage. Global reactivity descriptors, Fukui indices, atomic charges and NBO analysis showed that the priority of charge reallocation form inhibitor MOs to the metal surface is easier in the order: Z3 > Z2 > Z1 which reveal good agreement to the electrochemical measurements. Based on DFT results, an inhibition mechanism was proposed. (C) 2021 Elsevier B.V. All rights reserved.
机译:三种三唑衍生物的缓蚀作用;用动电位极化(PDP)、电化学阻抗谱(EIS)、扫描电子显微镜(SEM)和扫描电子显微镜(SEM)研究了对甲苯基-1H-1,2,3-三唑-5-醇(Z1)、4-氯苯基-1H-1,2,3-三唑-5-醇(Z2)和甲基-4-(5-羟基-1H-1,2,3-三唑-1-基)苯甲酸酯(Z3)在1.0MHCl中对金属铝的吸附行为,B3LYP密度泛函理论(DFT)和吸附退火模拟。电化学结果显示,抑制效率的增加顺序为:Z3>Z2>Z1,在500 ppm时,从Z3获得最大抑制效率(74.7%)。阳极(βa)和阴极(βc)塔菲尔常数都受到向腐蚀介质中添加缓蚀剂的显著影响,呈现混合型性质。缓蚀剂在金属表面的吸附是一个自发的过程,遵循朗缪尔等温线。构象扫描和退火吸附模拟显示,三唑环和苯环之间的二面角仅为30度,这促进了最佳表面覆盖率。整体反应性描述符、Fukui指数、原子电荷和NBO分析表明,从抑制剂MOs到金属表面的电荷再分配优先顺序为:Z3>Z2>Z1,这与电化学测量结果一致。基于DFT结果,提出了一种抑制机理。(c)2021爱思唯尔B.V.保留所有权利。

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