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Conductions through head-to-head and tail-to-tail domain walls in LiNbO3 nanodevices

机译:通过LINBO3纳米型线的头部到头和尾域墙壁的磁度

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摘要

Conducting domain walls in an insulating ferroelectric matrix are interesting for the development of next generation multifunctional nanodevices with large output powers. However, electrical conductions are diversified among head-to-head (H-H), neutral (N), and tail-to-tail (T-T) domain walls (DWs) with disputable conduction mechanisms. It is generally accepted that the charged DWs are more electrically conductive than the neutral DWs. However, the charged walls are unstable due to high depolarization energies. Here, we stabilized the H-H DWs, NDWs and T-T DWs within a LiNbO3 transistor by controlling charge injection in compensation of the domain boundary charge under applied drain-gate, drain-source and gate-source voltages. The walls were created through the local 180 degrees domain reversals in different inclined angles, and the transistors in different sizes were fabricated at the surfaces of 5 mol.% MgO-doped LiNbO3 single crystals in monodomain patterns. The NDWs are positively charged due to small inclination angles (similar to 1 degrees) and local sideways meandering behavior of the charged dipoles with electrical conduction that is three orders of magnitude higher than that across the T-T DWs but is one order of magnitude lower than that across the H-H DWs. Voltage dependences of wall currents can be fitted according to the space-charge-limited current equation with an exponential coefficient varying between 2.1 and 3.7 in some specific voltage ranges, implying discontinuous domain retraction in different inclined wall angles against the reduced applied voltage to affect the wall current. This finding provides the fundamental physics to improve domain wall conduction via domain reconstruction and broadens the domain wall application in future nano-devices. (c) 2021 Elsevier B.V. All rights reserved.
机译:绝缘铁电基体中的导电畴壁对于开发具有大输出功率的下一代多功能纳米器件非常有意义。然而,在头到头(H-H)、中性(N)和尾到尾(T-T)畴壁(DW)之间的导电是多样化的,导电机制存在争议。人们普遍认为,带电DW比中性DW更具导电性。然而,由于高的去极化能量,带电壁是不稳定的。在这里,我们通过控制电荷注入来稳定LiNbO3晶体管中的H-H DWs、NDW和T-T DWs,以补偿外加漏极、漏源和栅源电压下的畴边界电荷。通过不同倾斜角度的局部180度畴反转形成壁,并在5 mol.%MgO掺杂的LiNbO3单晶表面以单畴模式制备了不同尺寸的晶体管。由于小倾角(类似于1度)和带电偶极子的局部侧向弯曲行为,NDW带正电荷,导电性比T-T DWs高三个数量级,但比H-H DWs低一个数量级。壁电流的电压依赖性可根据空间电荷限制电流方程进行拟合,在某些特定电压范围内,指数系数在2.1和3.7之间变化,这意味着不同倾斜壁角下的不连续畴收缩对降低的施加电压产生影响,从而影响壁电流。这一发现为通过畴重构改善畴壁导电提供了基础物理,并拓宽了畴壁在未来纳米器件中的应用。(c)2021爱思唯尔B.V.保留所有权利。

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