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High-intensity x-ray microbeam for macromolecular crystallography using silicon kinoform diffractive lenses

机译:用于大分子晶体学使用硅片衍射镜片的高强度X射线微观

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摘要

Macromolecular crystallography often requires focused high-intensity x-ray beams for solving challenging protein structures from micrometer-sized crystals using current synchrotron radiation sources. The design of optical focusing schemes for hard x-rays showing high efficiency and flexibility in beam size is therefore continuously pursued. Here, we present an innovative solution based on a two-stage demagnification of the undulator source for photon energies from 6 keV to 19 keV, commissioned at the X10SA beamline of the Swiss Light Source, where a secondary source is imaged by two crossed silicon kinoform x-ray diffractive lenses with 75 nm outermost zone width. A source-size limited spot with a size of 4.8 mu m x 1.7 mu m (h x v, FWHM) and flux of 7.5 x 10(10) photons/s at 12.4 keV is demonstrated at the sample position. (C) 2018 Optical Society of America
机译:大分子结晶通常需要聚焦的高强度X射线束,用于使用电流同步辐射源从微米尺寸的晶体求解攻击蛋白质结构。 因此,连续追求表现出高效率和光束尺寸的柔韧性的硬X射线的光学聚焦方案的设计。 在这里,我们提出了一种创新的解决方案,基于从6kev到19 kev的光子能量的两个阶段脱轨,在瑞士光源的X10SA梁线上委托,其中二次硅基族成像 X射线衍射透镜,具有75nm最外面的区域宽度。 在样品位置,在样品位置对尺寸为4.8μm×1.7μm(h x V,fwhm)和7.5×10(10)光子/ s的磁通量的源极限限制点。 (c)2018年光学学会

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