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Unilateral-shift-subtracting confocal microscopy with nanoscale axial focusing precision

机译:用纳米级轴向聚焦精度单侧移液 - 减去共聚焦显微镜

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摘要

A novel unilateral-shift-subtracting confocal microscopy (USSCM) method with nanoscale axial focusing precision is proposed based on the optical arrangement of conventional confocal microscopy (CM). As the two segments of data on both sides of the confocal axial response curve are very sensitive to variations of the axial position, USSCM introduces an axial shift of S for one segment, to intersect it with the other segment. It then separately interpolates the two segments of intersecting data, subtracts the corresponding interpolated data, and selects the data that exhibit a good linearity from all of the subtracted data to fit a straight line. It calculates the zero position of the fitting line and offsets it by S/2, to precisely reveal the focus position of the confocal system, thereby achieving high-precision imaging of the three-dimensional sample's structure. Theoretical analyses and preliminary experiments indicate that, for excitation wavelength of lambda = 405 nm, numerical aperture of NA = 0.95, and normalized axial shift of S = 5.21, USSCM achieves an axial resolution of 3 nm and a repetitive focusing precision of 1.5 nm, while it does not change the lateral resolution of CM. Furthermore, compared with conventional CM, under the same noise condition, USSCM is less affected by system aberration, which leads to higher focusing precision. These findings demonstrate that USSCM is a very efficient method for imaging. (C) 2018 Optical Society of America
机译:基于传统的共聚焦显微镜(CM)的光学布置,提出了一种新的单侧移桡 - 减去了具有纳米级轴向聚焦精度的共聚焦微观显微镜(USSCM)方法。由于共聚焦轴向响应曲线两侧的数据的两个分段对轴向位置的变化非常敏感,USSCM引入了一个区段的S轴向偏移,与其他段相交。然后,它单独地插值与交叉数据的两个段,减去相应的内插数据,并选择从所有减去的数据中表现出良好线性度以适合直线的数据。它计算配合线的零位置并通过S / 2偏离它,精确地揭示了共聚焦系统的焦点位置,从而实现了三维样本结构的高精度成像。理论分析和初步实验表明,对于λ= 405nm的激发波长,Na = 0.95的数值孔径,并且SSCM的归一化轴向偏移,USSCM实现了3nm的轴向分辨率和1.5 nm的重复聚焦精度。虽然它不会改变cm的横向分辨率。此外,与常规CM相比,在相同的噪声条件下,USSCM受系统像差影响的影响,这导致更高的聚焦精度。这些研究结果表明,USSCM是一种非常有效的成像方法。 (c)2018年光学学会

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  • 来源
    《Applied optics》 |2018年第30期|共11页
  • 作者单位

    Beijing Inst Technol Sch Opt &

    Photon Beijing Key Lab Precis Optoelect Measurement Inst Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Key Lab Precis Optoelect Measurement Inst Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Key Lab Precis Optoelect Measurement Inst Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Key Lab Precis Optoelect Measurement Inst Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Key Lab Precis Optoelect Measurement Inst Beijing 100081 Peoples R China;

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  • 正文语种 eng
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