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首页> 外文期刊>Applied optics >Two-photon, three-photon, and four-photon near-infrared quantum cutting luminescence of an Er3+ activator in tellurium glass phosphor
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Two-photon, three-photon, and four-photon near-infrared quantum cutting luminescence of an Er3+ activator in tellurium glass phosphor

机译:碲玻璃磷中ER3 +活化剂的双光子,三光子和四光子近红外量子切割发光

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Multiphoton near-IR downconversion quantum cutting luminescence of Er3+-ion-doped tellurium glass is studied. We find that the excitation spectra of 1532.0 nm IR light and 550.0 nm visible light are very similar in wave shape and peak wavelength. When the concentration of Er3+ ions is increased from 0.5% to 3.2%, we observe that both the IR luminescence and excitation intensity of the samples are increased by a factor of 1.80-5.49, with a concomitant decrease in both visible luminescence and excitation intensity by a factor of 0.87-1.91. Therefore, we conclude that the present phenomenon is a multiphoton near-IR quantum cutting luminescence phenomenon. We also find that the near-IR quantum cutting efficiency up-limits of the I-4(9/2), F-4(9/2), S-4(3/2), and H-2(11/2) states are respectively 157%, 138%, 193%, and 192% for Er3+ (3.2%) : tellurium glass and 175%, 154%, 233%, and 233% for Er3+ (5.0%):tellurium glass. (C) 2016 Optical Society of America
机译:研究了ER3 + IION型碲玻璃的多光子近IR下式量子切割发光。 我们发现波形和峰值波长的1532.0nm IR光和550.0nm可见光的激发光谱非常相似。 当ER3 +离子的浓度从0.5%增加到3.2%时,我们观察到样品的IR发光和激发强度均增加了1.80-5.49的因子,伴随着可见发光和激发强度的伴随 因子0.87-1.91。 因此,我们得出结论,目前现象是近红外量子切割发光现象的多光子。 我们还发现,I-4(9/2),F-4(9/2),S-4(3/2)和H-2(11 /)的近红外量子切割效率上限 2)ER3 +(3.2%):碲玻璃和175%,154%,233%,233%,碲玻璃(5.0%):碲玻璃:碲玻璃和233%,分别为157%,138%,192%,192%,为175%,154%,233%,233%:碲玻璃。 (c)2016年美国光学学会

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  • 来源
    《Applied optics》 |2016年第12期|共8页
  • 作者单位

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Beijing Normal Univ Coll Chem Beijing 100875 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Shanghai Inst Technol Sch Mat Sci &

    Technol Shanghai 200235 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Chinese Acad Sci Shanghai Inst Opt &

    Fine Mech Shanghai 201800 Peoples R China;

    Beijing Normal Univ Appl Opt Beijing Area Major Lab Beijing 100875 Peoples R China;

    Univ Arkansas Dept Phys Fayetteville AR 72701 USA;

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  • 正文语种 eng
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