Gas flow rate control in basic processes of ion-plasma and ion-beam deposition of multilayer coatings with controlled properties

摘要

The control algorithms and scheme of gas flow rate control system for technology of ion-beam and ion-plasma deposition of multi-layer coatings have been considered. This system provides a constant pressure in vacuum chamber and steady composition of working gases mixture for magnetron sputtering setup as well as a constant ion or discharge current for ion-beam sputtering ones. The system is able to work in automatic mode or under the control of outboard computer. The possibility ofthis system application for multi-layer protective coatings deposition is considered.