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首页> 外文期刊>ChemPlusChem >Synthesis of Diphenylchalcogenophene Diboronic Acid Bis(pinacol) Esters and Halogen Photoelimination from Tellurium by Triplet-Triplet Annihilation
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Synthesis of Diphenylchalcogenophene Diboronic Acid Bis(pinacol) Esters and Halogen Photoelimination from Tellurium by Triplet-Triplet Annihilation

机译:三重蛋白 - 三重素湮灭合成二苯基致苯乙烯脱硼酸双(PINACOL)酯和卤素光束

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摘要

The synthesis of diphenylthiophene-, diphenylselenophene-, and diphenyltellurophene-based diboronic bis(pinacol) esters and their optoelectronic properties is reported. The addition of bromine to the borylated diaryltellurophene and subsequent photoelimination are investigated. The photochemical quantum yield of bromine photoelimination is (9.7 +/- 0.2)% at a 4.4m trap (2,3-dimethyl-1,3-butadiene) concentration. It is found that the bromine photoelimination reaction can also be driven by the incorporation of a triplet sensitizer through a triplet-triplet annihilation process.
机译:据报道了二苯基噻吩 - ,二苯基硒丙烯烯和二苯基鼻蛋白酚基脱硼双(Pinacol)酯的合成及其光电性能。 研究了向硼酸化的二芳基苯乙烯和随后的光束中加入溴。 在4.4M捕集器(2,3-二甲基-1,3-丁二烯)浓度下,溴光纤维的光化学量子产率为(9.7 +/- 0.2)%。 发现溴光纤维测定反应也可以通过三重胶质 - 三重胶质湮灭工艺掺入三重态敏化剂来驱动。

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