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Analysis of the optic/impurity-particle/pad interaction for reduction of scratches formed on optics during pad polishing

机译:分析光学元件/杂质颗粒/垫片的相互作用,以减少在垫片抛光过程中在光学元件上形成的划痕

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摘要

A model for interactions of a single large impurity particle with the optic and pad during pad-polishing has been developed to detailedly illustrate the scratch formation process. Equations for calculating the normal load applied on the optic by the impurity particle are provided, and the friction between the optic and impurity particle has also been considered in scratch formation. Initiation and evolution of the scratches under the combined effects of the normal and friction forces are illustrated in the model. The most important factors affecting the normal load and thus scratch formation have been analyzed and verified using published experimental results. Based on themodel, the implications in reduction of scratch formed on optics during pad polishing have been analyzed.
机译:已经开发了用于在抛光垫中单个大杂质粒子与光学元件和抛光垫相互作用的模型,以详细说明划痕的形成过程。提供了用于计算杂质颗粒施加在光学元件上的法向载荷的方程式,并且在划痕形成过程中还考虑了光学元件和杂质颗粒之间的摩擦。该模型说明了在法向力和摩擦力共同作用下的划痕的产生和演变。已使用已发表的实验结果分析和验证了影响法向载荷从而影响划痕形成的最重要因素。基于该模型,已经分析了减少抛光垫期间在光学器件上形成划痕的意义。

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