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The use of SEM to investigate the effect of an electron beam on the optically-visible flashover treeing of MgO ceramic

机译:SEM用于研究电子束对MgO陶瓷的光学可见闪络树的影响

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摘要

This paper introduces the use of a scanning electron microscope (SEM) to evaluate the insulation property of insulators under electron bombardment. An SEM may be used not only to observe a surface image but also to provide a fine electron beam for charging an insulator surface simultaneously. The distribution of electric field created by the surface charging can be developed by a simple model. The increase of electric field at the surface may exceed a critical value to experience a surface breakdown/optically-visible flashover. The insulation property is evaluated by measuring the period of charging/electron bombardment, which is needed to initiate a treeing-formation (hereinafter time to flashover treeing/TTF). In this paper, under a 25 keV primary electron beam energy and for a magnification of 5000x, a 99.95% purity polycrystalline MgO specimen resulted in 7 min TTF. It was also observed that increasing the primary beam energy and the SEM's magnification decreased the TTF. Therefore, at for a given energy and magnification, this method can be used to evaluate the insulation property of insulators under an electron beam environment.
机译:本文介绍了使用扫描电子显微镜(SEM)评估电子轰击下绝缘子的绝缘性能。 SEM不仅可以用于观察表面图像,而且可以提供细电子束以同时对绝缘体表面进行充电。由表面电荷产生的电场分布可以通过简单的模型来开发。表面处电场的增加可能超过临界值,以经历表面击穿/光学可见的飞弧。通过测量充电/电子轰击的时间段来评估绝缘性能,这是开始形成树状结构所需的时间(下文中为闪络树状结构/ TTF的时间)。在本文中,在25 keV的一次电子束能量和5000x的放大倍数下,纯度为99.95%的MgO多晶MgO样品产生了7分钟的TTF。还观察到增加主光束能量和SEM的放大倍数会降低TTF。因此,在给定的能量和放大倍数下,该方法可用于评估电子束环境下绝缘子的绝缘性能。

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