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Dissociation of water on oxygen-covered Rh{111}

机译:水在含氧Rh {111}上的离解

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The adsorption of water and coadsorption with oxygen on Rh{111} under ultrahigh vacuum conditions was studied using synchrotron-based photoemission and photoabsorption spectroscopy. Water adsorbs intact on the clean surface at temperatures below 154 K. Irradiation with x-rays, however, induces fast dissociation and the formation of a mixed OH+H_2O layer indicating that the partially dissociated layer is thermodynamically more stable. Coadsorption of water and oxygen at a coverage below 0.3 monolayers has a similar effect, leading to the formation of a hydrogen-bonded network of water and hydroxyl molecules at a ratio of 3:2. The partially dissociated layers are more stable than chemisorbed intact water with the maximum desorption temperatures up to 30 K higher. For higher oxygen coverage, up to 0.5 monolayers, water does not dissociate and an intact water species is observed above 160 K, which is characterized by an O 1s binding energy 0.6 eV higher than that of chemisorbed water and a high desorption temperature similar to the partially dissociated layer. The extra stabilization is most likely due to hydrogen bonds with atomic oxygen.
机译:使用基于同步加速器的光发射和光吸收光谱研究了超高真空条件下Rh {111}上的水吸附和氧共吸附。水在154 K以下的温度下完好无损地吸附在干净的表面上。但是,用X射线辐照会引起快速离解,并形成OH + H_2O混合层,表明部分离解的层在热力学上更稳定。水和氧在低于0.3单层的覆盖率下的共吸附具有相似的作用,从而导致水和羟基分子以3:2的比例形成氢键网络。部分解离的层比化学吸附的完整水更稳定,最大解吸温度高出30K。对于更高的氧气覆盖率(最多0.5个单层),水不会解离,并且在160 K以上会观察到完整的水物种,其特征是O 1s的结合能比化学吸附的水高0.6 eV,并且高解吸温度类似于部分解离的层。额外的稳定很可能是由于与原子氧的氢键。

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