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首页> 外文期刊>Physical Review, B. Condensed Matter >Electronic structure and physical properties of early transition metal mononitrides: Density-functional theory LDA, GGA, and screened-exchange LDA FLAPW calculations - art. no. 155106
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Electronic structure and physical properties of early transition metal mononitrides: Density-functional theory LDA, GGA, and screened-exchange LDA FLAPW calculations - art. no. 155106

机译:早期过渡金属单氮化物的电子结构和物理性质:密度泛函理论LDA,GGA和屏蔽交换LDA FLAPW计算-艺术。没有。 155106

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The desirable physical properties of hardness, high temperature stability, and conductivity make the early transition metal nitrides important materials for various technological applications. To learn more about the nature of these materials, first-principles density-functional theory calculations using the full-potential linearized augmented plane wave (FLAPW) method within the local-density approximation (LDA) and with the generalized gradient approximation (GGA) have been performed. We investigate the bulk electronic and physical properties of a series of early transition metal mononitrides, namely, those formed with 3d metals (ScN, TiN, VN), 4d metals (YN, ZrN, NbN), and 5d metals (LaN, HfN, TaN) in the rocksalt structure. In particular, lattice constants, bulk moduli, heats of formation, and cohesive energies as well as bulk band structures and densities of states are reported, and trends discussed. We find that the GGA yields 1%-2% larger lattice constants, 10%-20% smaller bulk moduli, and 10%-30% lower heats of formation compared to the LDA. The GGA slightly overestimates lattice constants, but leads overall to an improved agreement with experiment compared to the LDA, for which the values rue too small. These materials are metallic with the exception of ScN, YN, and LaN, which appear to be semimetals within the LDA (and GCA), but are in fact semiconductors with indirect band gaps of 1.58, 0.85, and 0.75 eV, respectively, as revealed by calculations performed using the screened-exchange LDA approach. These last, relatively unexplored. refractory III-V nitrides may therefore have potential use in device applications; in particular, ScN is well lattice matched to GaN, a wide-band-gap semiconductor that is of great current interest in relation to optoelectronic devices, and high temperature and high power electronic applications. [References: 64]
机译:硬度,高温稳定性和导电性的理想物理特性使早期过渡金属氮化物成为各种技术应用的重要材料。为了更多地了解这些材料的性质,使用局部密度近似(LDA)和广义梯度近似(GGA)的全势线性化增强平面波(FLAPW)方法进行第一原理密度泛函理论计算被执行。我们研究了一系列早期过渡金属单氮化物的整体电子和物理性质,即由3d金属(ScN,TiN,VN),4d金属(YN,ZrN,NbN)和5d金属(LaN,HfN, TaN)。特别是,报告了晶格常数,体模,形成热和内聚能以及体带结构和状态密度,并讨论了趋势。我们发现,与LDA相比,GGA产生的晶格常数大1%-2%,体积模量小10%-20%,形成热低10%-30%。与LDA相比,GGA略高估了晶格常数,但总体而言,与实验的一致性得到了改善,而LDA的值却太小。这些材料是金属,但ScN,YN和LaN似乎是LDA(和GCA)内的半金属,但实际上是间接带隙分别为1.58、0.85和0.75 eV的半导体。通过使用屏蔽交换LDA方法执行的计算。最后,相对未开发。因此,难熔的III-V族氮化物可能在器件应用中具有潜在用途;特别地,ScN与GaN晶格匹配良好,而GaN是一种宽带隙半导体,与光电子器件以及高温和高功率电子应用相关,在当前受到广泛关注。 [参考:64]

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