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Hexadecadienyl monolayers on hydrogen-terminated Si(111): Faster monolayer formation and improved surface coverage using the enyne moiety

机译:氢封端的Si(111)上的十六碳二烯基单层:使用烯炔部分可更快地形成单层并提高表面覆盖率

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To further improve the coverage of organic monolayers on hydrogen-terminated silicon (H-Si) surfaces with respect to the hitherto best agents (1-alkynes), it was hypothesized that enynes (H-C? - C-HC? - CH-R) would be even better reagents for dense monolayer formation. To investigate whether the increased delocalization of β-carbon radicals by the enyne functionality indeed lowers the activation barrier, the kinetics of monolayer formation by hexadec-3-en-1-yne and 1-hexadecyne on H-Si(111) were followed by studying partially incomplete monolayers. Ellipsometry and static contact angle measurements indeed showed a faster increase of layer thickness and hydrophobicity for the hexadec-3-en-1-yne-derived monolayers. This more rapid monolayer formation was supported by IRRAS and XPS measurements that for the enyne show a faster increase of the CH _2 stretching bands and the amount of carbon at the surface (C/Si ratio), respectively. Monolayer formation at room temperature yielded plateau values for hexadec-3-en-1-yne and 1-hexadecyne after 8 and 16 h, respectively. Additional experiments were performed for 16 h at 80° to ensure full completion of the layers, which allows comparison of the quality of both layers. Ellipsometry thicknesses (2.0 nm) and contact angles (111-112°) indicated a high quality of both layers. XPS, in combination with DFT calculations, revealed terminal attachment of hexadec-3-en-1-yne to the H-Si surface, leading to dienyl monolayers. Moreover, analysis of the Si _(2p) region showed no surface oxidation. Quantitative XPS measurements, obtained via rotating Si samples, showed a higher surface coverage for C _(16) dienyl layers than for C _(16) alkenyl layers (63% vs 59%). The dense packing of the layers was confirmed by IRRAS and NEXAFS results. Molecular mechanics simulations were undertaken to understand the differences in reactivity and surface coverage. Alkenyl layers show more favorable packing energies for surface coverages up to 50-55%. At higher coverages, this packing energy rises quickly, and there the dienyl packing becomes more favorable. When the binding energies are included the difference becomes more pronounced, and dense packing of dienyl layers becomes more favorable by 2-3 kcal/mol. These combined data show that enynes provide the highest-quality organic monolayers reported on H-Si up to now.
机译:为了进一步改善迄今最佳试剂(1-炔烃)在氢封端的硅(H-Si)表面上有机单层的覆盖率,假设烯炔(HC3-C-HC2-CH-R)将是形成密集单层的更好试剂。为了研究烯键官能团增加的β-碳自由基的离域是否确实降低了活化势垒,依次研究了H-Si(111)上的hexadec-3-en-1-yne和1-hexadecyne单层形成的动力学研究部分不完整的单层。椭圆偏振法和静态接触角测量确实显示了十六烷基-3-en-1-炔衍生的单层的层厚度和疏水性的更快增加。 IRRAS和XPS测量支持这种更快的单层形成,对于烯炔而言,分别显示CH _2拉伸带和表面碳含量(C / Si比)的增加更快。室温下单层形成分别在8和16小时后产生hexadec-3-en-1-yne和1-hexadecyne的平稳值。在80°下进行了16小时的附加实验,以确保各层完全完成,从而可以比较两层的质量。椭偏仪的厚度(2.0nm)和接触角(111-112°)表明两层都是高质量的。 XPS与DFT计算相结合,揭示了hexadec-3-en-1-yne在H-Si表面的末端附着,导致二烯基单层。此外,对Si _(2p)区域的分析显示没有表面氧化。通过旋转Si样品获得的定量XPS测量结果显示,C _(16)二烯基层的表面覆盖率高于C _(16)烯基层的表面覆盖率(63%对59%)。 IRRAS和NEXAFS结果证实了层的致密堆积。进行分子力学模拟以了解反应性和表面覆盖率的差异。烯基层显示出更有利的堆积能,表面覆盖率高达50-55%。在较高的覆盖率下,该堆积能量迅速增加,并且二烯基堆积变得更加有利。当包含结合能时,差异变得更加明显,并且二烯基层的致密堆积通过2-3kcal / mol变得更加有利。这些综合数据表明,到目前为止,烯炔提供了H-Si上报道的最高质量的有机单层。

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