EFFECT OF SB CONTENT ON THE OPTICAL PROPERTIES OF Ag_(100-x)Sb_x WRITE-ONCE OPTICAL RECORDING THIN FILM

摘要

Ag_(100-x)Sb_x films with x=10.8 approx 25.5 at. percent are fabricated on the glass and naturally oxidized silicon wafer substrates by rf magnetron sputtering. The effects of Sb content on the optical properties and microstructures of the film are investigated. It is found that a large reflection change occurs between 250 deg C and 275 deg C for all the films. From the measurement of optical properties and X-ray diffraction analysis, we found that the as-deposited film is a high reflectance epsilon'-AgSb phase. The reflectance decreases rapidly after annealing at 300 deg C, this is due to the huge change of grain size and grain size distribution. The absorption of Ag_(100-x)Sb_x films remains constant at the wavelength between 400nm and 800nm. The grain size of as-deposited Ag_(80.9)Sb_(19.1) film is about 5nm approx 10nm and it grows up to 10nm approx 30nm after annealing at 300 deg C. The reflective contrast of this film is as high as 17 percent for lambda = 405nm. This film is a promising candidate for short wavelength high-density optical recording application.