首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >TEXTURED BINARY COMPOUND THIN FILMS OBTAINED BY SUBSTITUTION OF THE CHALCOGEN OF A PRE-TEXTURED CHALCOGENIDE FILM
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TEXTURED BINARY COMPOUND THIN FILMS OBTAINED BY SUBSTITUTION OF THE CHALCOGEN OF A PRE-TEXTURED CHALCOGENIDE FILM

机译:通过替代预先形成的硫族化物薄膜的硫获得的纹理化的二元复合薄膜

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摘要

Layers of MoSe2, MoS2, MoO3 and WS2, WO3 on glass substrates have been obtained from MoTe2 and WSe2 films respectively. First, textured MoTe2 and WSe2 films were prepared by annealing under chalcogen pressure of constituents in thin film form. Then they were annealed under Se, S or O pressure in order to obtain the desired new compound. The annealing conditions were optimized for each compound by checking the texture of the films with an X-ray diffractometer. It was found that textured layers of MoSe2, MoS2, MoO3 and WS2 can be obtained while the crystallites of WO3 films were randomly oriented. A number of proposals are advanced to understand how textured films can be obtained in such a way: One of the elements of the compound should have a very small pressure vapour at the working temperature. The free enthalpy of the new compound should be more negative than that of the initial product. The ionic radius of the substituent should be smaller than that of the substituted atom. To obtain textured film, the lattice constants of the final compound should not be too different from those of the initial one. The first optical results obtained for MoSe2 layers are very promising. [References: 27]
机译:玻璃基板上的MoSe2,MoS2,MoO3和WS2,WO3层分别是从MoTe2和WSe2薄膜获得的。首先,通过在硫属元素压力下对薄膜形式的成分进行退火,制备织构化的MoTe2和WSe2薄膜。然后将它们在Se,S或O压力下退火,以获得所需的新化合物。通过使用X射线衍射仪检查薄膜的质地,对每种化合物的退火条件进行了优化。发现在WO 3薄膜的微晶随机取向的同时,可以获得MoSe 2,MoS 2,MoO 3和WS 2的织构层。提出了许多建议来理解如何以这种方式获得纹理化薄膜:化合物的一种元素在工作温度下应具有非常小的压力蒸气。新化合物的自由焓应比初始产物的负焓更大。取代基的离子半径应小于被取代原子的离子半径。为了获得带纹理的薄膜,最终化合物的晶格常数不应与初始化合物的晶格常数相差太大。 MoSe2层获得的第一个光学结果非常有前途。 [参考:27]

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