Foreword

摘要

In September 1957,Carl Frosch and Link Derick published an epochal paper in the Journal of The Electrochemical Society entitled,"Surface Protection and Selective Masking During Diffusion in Silicon."In it they described their 1955 discovery at Bell Labs of ways to form a silicon-dioxide layer on the surface of silicon wafers during the high-temperature diffusion process.In addition,they demonstrated how this glassy protective layer could be etched for use in patterning selected regions of p-type and n-type impurities in the underlying silicon.