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QSAR models for oxidation of organic micropollutants in water based on ozone and hydroxyl radical rate constants and their chemical classification

机译:基于臭氧和氢氧根自由基速率常数的QSAR水中有机微量污染物氧化模型及其化学分类

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Ozonation is an oxidation process for the removal of organic micropollutants (OMPs) from water and the chemical reaction is governed by second-order kinetics. An advanced oxidation process (AOP), wherein the hydroxyl radicals (OH radicals) are generated, is more effective in removing a wider range of OMPs from water than direct ozonation. Second-order rate constants (k_(OH) and k_(O3) are good indices to estimate the oxidation efficiency, where higher rate constants indicate more rapid oxidation. In this study, quantitative structure activity relationships (QSAR) models for O_3 and AOP processes were developed, and rate constants, k_(OH) and (k_(O3), were predicted based on target compound properties. The (k_(O3) and (k_(OH) values ranged from 5 * 10 ~(-4)to 10~s M~(-1)s~(-1) and 0.04 to 18 * (10~9) M~(-1) s~(-1) respectively. Several molecular descriptors which potentially influence O_3 and OH radical oxidation were identified and studied. The QSAR-defining descriptors were double bond equivalence (DBE), ionisation potential (IP), electron-affinity (EA) and weakly-polar component of solvent accessible surface area (WPSA), and the chemical and statistical significance of these descriptors was discussed. Multiple linear regression was used to build the QSAR models, resulting in high goodness-of-fit, r~2 (>0.75). The models were validated by internal and external validation along with residual plots.
机译:臭氧化是一种用于从水中去除有机微污染物(OMP)的氧化过程,化学反应受二级动力学控制。先进的氧化过程(AOP)(其中产生了羟基自由基(OH自由基))比直接臭氧化对从水中去除更广泛的OMP更为有效。二阶速率常数(k_(OH)和k_(O3)是评估氧化效率的良好指标,其中较高的速率常数表示更快的氧化。在这项研究中,O_3和AOP过程的定量结构活性关系(QSAR)模型进行了开发,并根据目标化合物的性质预测了速率常数k_(OH)和(k_(O3)。(k_(O3)和(k_(OH))的值范围为5 * 10〜(-4)至10〜s M〜(-1)s〜(-1)和0.04至18 *(10〜9)M〜(-1)s〜(-1)。几种可能影响O_3和OH自由基氧化的分子描述子定义和研究QSAR定义的描述词是双键当量(DBE),电离势(IP),电子亲和力(EA)和溶剂可及表面积(WPSA)的弱极性成分,以及化学和统计学意义对这些描述符进行了讨论,使用多元线性回归建立了QSAR模型,从而得到了较高的拟合优度r〜2(> 0.75)。通过内部和外部验证以及残差图对ls进行了验证。

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