In this paper, we consider an optimization problem of lens adjustment in semiconductor lithography equipment. The problem to obtain optimal adjustment of lens can be naturally formulated as a convex minimization problem. However, in such a formulation the objective function is convex but contains many nondifferentiable points, and thus methods based on derivatives cannot be applied. Other approaches using derivative- free optimization or meta-heuristic methods cannot guarantee that obtained solutions are truly optimal. From such a background, we formulate the problem as quadratically constrained and second-order cone programming problems, which can be handled by solvers using an interior point method. With the proposed formulations, computational simulations show that optimal adjustment of lens is obtained in a practical computational time.%本論文は，半導体露光装置におけるレンズ自動調整rnの最適化について述べる．最近の半導体露光装置は，rn線幅45nmの解像力が求められ，波面収差RMSをrn数mλに抑えなくてはならない．また，露光装置のrn生産性向上にともなって，単位時間あたりのレーザーrn照射エネルギーが増加し，収差に与える露光熱の影響rnが無視できなくなっている．
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