首页> 外文期刊>Thin Solid Films >Investigation of Ti0.54Al0.46/Ti0.54Al0.46N multilayer films deposited by reactive gas pulsing process by nano-indentation and electron energy-loss spectroscopy
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Investigation of Ti0.54Al0.46/Ti0.54Al0.46N multilayer films deposited by reactive gas pulsing process by nano-indentation and electron energy-loss spectroscopy

机译:纳米压痕和电子能量损失谱研究反应性气体脉冲沉积Ti0.54Al0.46 / Ti0.54Al0.46N多层膜

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Physical vapour deposition technology is well suited to the deposition of advanced TiAIN-based coatings. Among these thin films, multilayer systems consisting of stacked layers of metallic Ti(1-x)Alx and nitride Ti1-xAlxN with x around 0.5 are expected to have improved mechanical properties with respect to single nitride layers of the same composition. A set of Ti0.54Al0.46/Ti0.54Al0.46N multilayer films with five different periods A (from 4 to 50 nm) were deposited using the reactive gas pulsing process (RGPP). This RGPP approach allows the deposition of TiAl-based alloyitride multilayer films by radio frequency reactive magnetron sputtering with a controlled pulsing flow rate of the nitrogen reactive gas. The coherent growth of the multilayer coatings, depending on the period, is checked by X-ray diffraction and the mechanical properties are determined by Berkovich nano-indentation and friction experiments. A model to describe the dependence of the indentation modulus M and the hardness H-B on the penetration depth h, the period Lambda, and the film thickness e(f) is proposed. The indentation modulus of the multilayer films (Math = 0 and for e(f) similar to 1900 nm) is found to be in the range of 340 GPa < M < 525 GPa approximate to M(Ti0.54Al0.46N). For a fixed penetration depth, M follows a Hall and Petch evolution as a function of the period (4 <= Lambda <= 50 nm). The Berkovich hardness, 25 GPa < H-B < 50 GPa, also presents the same kind of evolution, and for Lambda < 16 nm (at h = 0), H-B > H-B (Ti0.54Al0.46N) = 33 GPa. Hence, a superlattice effect is clearly evidenced. Moreover, for the larger periods, the wear behaviour of these multilayered coatings seems to be dominated by the plastic deformation of the metallic layer. The multilayer coating of period Lambda = 10 nm, which exhibits a diffraction pattern typical of superlattices and favourable mechanical properties, is more precisely investigated. Transmission electron microscopy confirms the main growth of the film along the [111] direction, and the evolution of the bonding of nitrogen in the direction normal to the rough interfaces between Ti0.54Al0.46 and Ti0.54Al0.46N layers is specified by electron energy-loss near-edge spectroscopy. Nitride nano-grains are included in the metallic layer, which attests to the mixing of nitrogen into the layers. The structure of these nano-grains presents a progressive evolution into the layer and gradually acquires a TiN-like structure near the interface. For this Lambda = 10 nm period, the indentation modulus and hardness for different penetration depths are weakly sensitive to the multilayer film thickness. (C) 2017 Elsevier B.V. All rights reserved.
机译:物理气相沉积技术非常适合用于高级TiAIN基涂层的沉积。在这些薄膜中,由具有约0.5的x的金属Ti(1-x)Alx和氮化物Ti1-xAlxN的堆叠层组成的多层系统被期望相对于相同组成的单个氮化物层具有改善的机械性能。使用反应气体脉冲过程(RGPP)沉积了一组具有五个不同周期A(从4到50 nm)的Ti0.54Al0.46 / Ti0.54Al0.46N多层膜。该RGPP方法允许通过射频反应性磁控管溅射以受控的氮气反应性气体的脉冲流速沉积TiAl基合金/氮化物多层膜。通过X射线衍射检查多层涂层的相干生长,取决于时间,并通过Berkovich纳米压痕和摩擦实验确定其机械性能。提出了描述压痕模量M和硬度H-B与熔深深度h,周期Lambda和膜厚e(f)的关系的模型。多层膜的压痕模量(Math = 0,e(f)类似于1900 nm)在340 GPa H-B(Ti0.54Al0.46N)= 33 GPa。因此,清楚地证明了超晶格效应。此外,在较大的时期内,这些多层涂层的磨损行为似乎主要由金属层的塑性变形决定。更精确地研究了周期λ= 10 nm的多层涂层,该涂层表现出典型的超晶格衍射图和良好的机械性能。透射电子显微镜证实了薄膜沿[111]方向的主要生长,并且氮在垂直于Ti0.54Al0.46和Ti0.54Al0.46N层之间的粗糙界面的方向上的键合演变由电子确定能量损失近边缘光谱。氮化物纳米颗粒包含在金属层中,这证明了氮已混入金属层中。这些纳米颗粒的结构向该层中逐渐发展,并在界面附近逐渐获得类似TiN的结构。对于该λ= 10nm的周期,对于不同的穿透深度,压痕模量和硬度对多层膜厚度敏感。 (C)2017 Elsevier B.V.保留所有权利。

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