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首页> 外文期刊>Theoretical foundations of chemical engineering >Forming Porous Structures on Silicon with a Ferroelectric for Capacitive Microelectronic and Microsystems Engineering Elements
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Forming Porous Structures on Silicon with a Ferroelectric for Capacitive Microelectronic and Microsystems Engineering Elements

机译:电容微电子和微系统工程元件用铁电在硅上形成多孔结构

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摘要

The formation of heterostructures based on porous silicon with barium titanate for application in capacitive electronic and microsystem engineering elements has been experimentally investigated. The dependences of the capacitance and permittivity on the porous matrix dimensions, number of deposited barium titanate layers, and material of capacitor structure plates has been analyzed.
机译:实验研究了基于多孔硅与钛酸钡的异质结构的形成,以用于电容性电子和微系统工程元件。分析了电容和介电常数对多孔基质尺寸,钛酸钡沉积层数和电容器结构板材料的依赖性。

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