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(0001) Interfaces between M_2O_3 corundum oxides (M = Al, Ti, V, Cr, Fe)

机译:(0001)M_2O_3刚玉氧化物之间的界面(M = Al,Ti,V,Cr,Fe)

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摘要

The structural quality of oxide/oxide interfaces, their chemistry, and the nature of their electronic states are critical properties for new promising applications and require continuous advances in their fundamental understanding. To this goal, we have performed a theoretical study of a series of (0001) M2O3/M’2O3interfaces (M, M’  =  Al, Ti, V, Cr, Fe) between simple and transition metal oxides crystallizing in the corundum structure. Our DFT+U results reveal two qualitatively different mechanisms of interface charge redistribution: an interfacial oxidation–reduction reaction occurring at Ti2O3/V2O3and Ti2O3/Fe2O3contacts, and a much weaker electron transfer along anion-cation bonds which follows the difference of ionicity between the two constituting oxides at all interfaces. At variance with interfaces betweenspsemiconductors, the band bending does not propagate beyond one or two atomic layers. More generally, our results show that the nature of the interface electronic structure and the energetics of its formation can be tightly linked to the properties of the corresponding bulk oxides, thus providing a precious tool for designing oxide/oxide interfaces of required characteristics.
机译:氧化物/氧化物界面的结构质量,其化学性质以及其电子态的性质对于新的有前景的应用而言是至关重要的特性,并且需要对其基本理解进行不断的改进。为此,我们对在刚玉结构中结晶的简单和过渡金属氧化物之间的一系列(0001)M2O3 / M’2O3界面(M,M'= Al,Ti,V,Cr,Fe)进行了理论研究。我们的DFT + U结果揭示了两种本质上不同的界面电荷再分布机制:在Ti2O3 / V2O3和Ti2O3 / Fe2O3接触处发生界面氧化还原反应,以及沿着阴离子-阳离子键的电子转移弱得多,这取决于两者之间的离子性差异在所有界面处构成氧化物。在与半导体之间的界面变化的情况下,能带弯曲不会传播超过一或两个原子层。更普遍地,我们的结果表明,界面电子结构的性质及其形成的能量可以与相应的本体氧化物的性质紧密相关,从而为设计具有所需特性的氧化物/氧化物界面提供了宝贵的工具。

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