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Photochemistry on TiO_2: Mechanisms behind the surface chemistry

机译:TiO_2上的光化学:表面化学背后的机理

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Photochemistry from TiO_2 surfaces is described for two cases: The UV-induced photodesorption of O_2 from TiO_2(110) - 1 × 1; and the hydrophilic effect caused by UV irradiation on TiO_2. In both cases fundamental information about how these processes occur has been found. In the case of the O_2 photodesorption kinetics, it has been found that the rate of the process is proportional to the square root of the UV flux, showing that second-order electron-hole pair recombination is dominant in governing the photodesorption rate. In addition these measurements provide an estimate of the concentration of hole traps in the TiO_2 crystal. In other measurements of the UV-induced hydrophilicity, starting with the atomically-clean TiO_2 surface, it has been shown that the effect occurs suddenly at a critical point during irradiation as a result of photooxidation of a monolayer of hydrocarbon (n-hexane) at equilibrium with ppm concentration of n-hexane in O_2 at 1 atmosphere pressure.
机译:TiO_2表面的光化学描述了两种情况:UV诱导TiO_2(110)-1×1吸收O_2。紫外线对TiO_2的亲水作用。在这两种情况下,都已找到有关这些过程如何发生的基本信息。在O_2光解吸动力学的情况下,已经发现该过程的速率与UV通量的平方根成比例,表明二阶电子-空穴对复合在支配光解吸速率中是主要的。另外,这些测量提供了对TiO_2晶体中空穴陷阱浓度的估计。在其他紫外线诱导的亲水性测量中,从原子清洁的TiO_2表面开始,结果表明,在辐照过程中,由于碳氢化合物(正己烷)单层的光氧化作用,该作用突然在临界点发生。在1个大气压下,O_2中正己烷的ppm浓度达到平衡。

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