机译:升高温度下离子照射下Si Nanopillars的形态学改性:塑性变形和控制稀疏10nm
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
CEA Leti Rue Martyrs 17 F-38054 Grenoble France;
CEA Leti Rue Martyrs 17 F-38054 Grenoble France;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
Helmholtz Zentrum Dresden Rossendorf Inst Ion Beam Phys & Mat Res Bautzner Landstr 400 D-01328 Dresden Germany;
helium ion microscopy; sub-10 nm fabrication; Monte Carlo simulation; ion beam damage; amorphization;