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Influence of fin width on single event-upset characteristics of FinFET SRAM

机译:翅片宽度对FinFET SRAM单一事件镦粗特征的影响

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In this paper, the influence of fin width on single event-upset (SEU) characteristics of 14 nm bulk and SOI FinFET 6 T SRAM is investigated by 3D TCAD mixed-mode simulation. Simulation results show that the threshold linear energy transfer (LETth) of SOI FinFET SRAM is larger than bulk FinFET SRAM. Moreover, the LETth of bulk and SOI FinFET SRAM increases with fin width scaling, and LETth of SOI FinFET SRAM increases more rapidly than bulk FinFET counterpart. The results indicate that bulk and SOI FinFET SRAM would be more immune to SEU response as fin width scales down, especially for SOI FinFET SRAM. Furthermore, the effect of fin width on critical charge and collected charge are explored to explain the fin width dependence of LETth in FinFET SRAM. Both critical charge and collected charge decrease with fin width reducing. However, the collected charge decreases much faster, which becomes the dominant factor for single event sensitivity of FinFET SRAM with fin width scaling.
机译:本文通过3D TCAD混合模式仿真研究了翅片宽度对14nm体积和SOI FinFET 6T SRAM的单一事件镦粗(SEU)特性的影响。仿真结果表明,SOI FinFET SRAM的阈值线性能量转移(Letth)大于散装FinFET SRAM。此外,散装和SOI FinFET SRAM的遗留与鳍宽度缩放增加,SOI FinFET SRAM的遗体比散装FinFET对应更快地增加。结果表明,随着鳍片宽度缩小,散装和SOI FinFET SRAM将更加免疫对SEU响应,特别是对于SOI FinFET SRAM。此外,探讨了翅片宽度对关键电荷和收集的电荷的影响,以解释遗留在FinFET SRAM中的翅片宽度依赖性。临界电荷和收集的电荷减少了翅片宽度。然而,收集的电荷减少得多,这成为FinFET SRAM与翅片宽度缩放的单一事件敏感性的主导因素。

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