首页> 外文期刊>Semiconductor science and technology >Performance enhancement of a proposed solar cell microstructure based on heavily doped silicon wafers
【24h】

Performance enhancement of a proposed solar cell microstructure based on heavily doped silicon wafers

机译:基于重掺杂硅晶圆的拟议太阳能电池微结构的性能增强

获取原文
获取原文并翻译 | 示例
       

摘要

This paper aims to present a proposed npn solar cell microstructure based on low cost heavily doped Silicon wafers. The physical perception of the proposed structure is based on the idea of vertical generation and lateral collection of light generated carriers. It should be mentioned that our structure can be utilized whenever the diffusion length of photogenerated electron hole pairs is smaller than the penetration depth of the solar radiation. The enhancement in the structure performance is attained by the optimization of the structure technological and geometrical parameters and based on practical considerations. This enhancement enables achieving the maximum possible structure conversion efficiency. Moreover, the optical performance, in terms of the spectral response and external quantum efficiency, is presented. The optimization is carried out using SILVACO TCAD process and device simulators. The main parameters used in optimization include the thickness and doping of the top n + layer as well as the sidewall emitter. Additionally, the structure base width along with the notch depth are considered. Finally, back surface treatment is introduced. The structure conversion efficiency in the initial step before optimization was 10.7%. As a result of the optimization process, the structure conversion efficiency is improved to about 15% above the initial case study by 4%.
机译:本文旨在提出一种基于低成本重掺杂硅晶片的npn太阳能电池微结构。拟议结构的物理感知是基于垂直生成和横向收集光生成的载波的想法。应该提到的是,只要光生电子空穴对的扩散长度小于太阳辐射的穿透深度,就可以利用我们的结构。通过优化结构技术和几何参数并基于实际考虑,可以提高结构性能。这种增强使得能够实现最大可能的结构转换效率。此外,根据光谱响应和外部量子效率,给出了光学性能。使用SILVACO TCAD过程和设备模拟器进行了优化。优化中使用的主要参数包括顶部n +层以及侧壁发射极的厚度和掺杂。另外,考虑了结构基部宽度以及切口深度。最后,介绍了背面处理。在优化之前的初始步骤中,结构转换效率为10.7%。优化过程的结果是,结构转换效率比最初的案例研究提高了约15%,提高了4%。

著录项

  • 来源
    《Semiconductor science and technology》 |2019年第3期|035012.1-035012.10|共10页
  • 作者单位

    Modern Sci & Arts Univ, Fac Engn, Dept Elect Commun & Elect Syst Engn, Cairo, Egypt|Hail Univ, Comp Coll, Dept Comp Engn, Hail, Saudi Arabia;

    Ain Shams Univ, Fac Engn, Dept Elect & Commun, Cairo, Egypt;

    Ain Shams Univ, Fac Engn, Engn Phys & Math Dept, Cairo, Egypt;

    Ain Shams Univ, Fac Engn, Dept Elect & Commun, Cairo, Egypt;

    Benha Univ, Fac Engn, Dept Basic Engn Sci, Banha, Egypt;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    solar cell; TCAD; heavily doped silicon wafers; conversion efficiency;

    机译:太阳能电池;TCAD;重掺杂硅片;转换效率;
  • 入库时间 2022-08-18 04:14:09

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号