Modules Are In, But Supertools Endure

摘要

It is hardly news that new low-k dielectrics and gate materials (no longer just oxide) require new metrology capabilities. Although materials being proposed for this first new generation of low-k are tractable, there are unsolved questions about fully characterizing porosity or carbon- or fluorine-doped oxides. While current metrology can handle present developments, advanced capabilities are needed for second-generation and more advanced low-k.