Franklin Kalk is CTO at Toppan Photomasks (Round Rock, Texas), the same position he held at DuPont Photomasks before it was acquired by Toppan Printing. He leads Toppan Photomasks' global R&D programs, supporting customers' technology roadmaps. He joined DuPont Photomasks in 1992, and served as manager of the R&D group at the DPI Reticle Technology Center (RTC). For years, Kalk has focused on photomask resolution enhancement technology issues and led company-wide programs aimed at improving the quality and yield of photomask products. Prior to joining DuPont Photomasks, he held a number of engineering and research positions within the electronics group of E.I. duPont de Nemours & Co. Kalk holds 15 U.S. patents and has published numerous technical papers. He has a Ph.D. in optics from the University of Rochester and a B.S. in physics from Emory University.
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