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'Ruler' Promises Nano-Precise Litho Calibration

机译:“统治者”承诺进行纳米精确的光刻校准

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Metrology calibration has always been composed of two parts: precision and accuracy. As defined by Sematech, statistical process control accuracy is the compliance of the measured or observed value to the true value or accepted reference value, while precision is the measure of natural variation of repeated measurements. Obviously, the precision component has always had greater importance than accuracy for calibration purposes, particularly in the accurate matching of tools to ensure that there is as small a variation as is physically possible between the measurements made by various platforms. Therefore, it is not surprising that inspection as well as process equipment OEMs have continuously worked over the years to gradually improve precision.
机译:计量校准始终由两部分组成:精度和准确性。根据Sematech的定义,统计过程控制精度是所测量或观察到的值是否符合真实值或可接受的参考值,而精度是对重复测量的自然变化的度量。显然,出于校准目的,尤其是在工具的精确匹配方面,精度组件一直比精度具有更高的重要性,以确保各种平台进行的测量之间的变化尽可能地小。因此,检查和过程设备原始设备制造商多年来不断努力以逐步提高精度也就不足为奇了。

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