首页> 外文期刊>Semiconductor International >Processing and Material Challenges Beyond 22 nm
【24h】

Processing and Material Challenges Beyond 22 nm

机译:22 nm以上的工艺和材料挑战

获取原文
获取原文并翻译 | 示例
           

摘要

Tom St. Dennis became general manager of the newly created Silicon Systems Group at Applied Materials Inc. (San Jose) in June 2007. The group encompasses Applied's entire portfolio of semiconductor manufacturing systems. Previously, St. Dennis served as senior vice president and general manager of Applied's Etch, Cleans, Front End and Implant product groups, and before that as executive vice president and a member of the office of the CEO at Novellus Systems (San Jose).
机译:Tom St. Dennis于2007年6月成为Applied Materials Inc.(圣何塞)新成立的Silicon Systems Group的总经理。该团队涵盖Applied的整个半导体制造系统产品组合。之前,St。Dennis曾担任Applied's Etch,Cleans,Front End和Implant产品部门的高级副总裁兼总经理,在此之前,他是Novellus Systems(圣何塞)的执行副总裁兼首席执行官办公室成员。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号