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首页> 外文期刊>Science of advanced materials >Electrical Properties of SrTiO3 and SrTiO3/NiO Thin Films in Heterojunction Devices
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Electrical Properties of SrTiO3 and SrTiO3/NiO Thin Films in Heterojunction Devices

机译:异质结器件中SrTiO3和SrTiO3 / NiO薄膜的电性能

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The temperature-dependent electrical properties of solution-processed SrTiO3 (STO) and NiO/STO thin films in heterojunction devices were investigated at 50-150 degrees C. The band offsets were measured by XPS through the core level (CL) binding energy peak positions of Sr3d, Ti2p, Ni2p and O1s. Diode like features in current (I)-voltage (V) response indicated interface-limited Schottky emission as the calculated optical dielectric constants, 4.11 for STO and 6.26 for NiO. The interfacial potential barrier height at zero bias was similar to 0.30 eV for both Si/Pt/STO/Pt and Si/PYSTO/NiO/Pt assemblies, indicating that reduction of leakage current owes it to the large conduction and valence band offset of similar to 2.02 and 2.17 eV, respectively.
机译:在50-150摄氏度下研究了异质结器件中固溶处理的SrTiO3(STO)和NiO / STO薄膜的温度相关电性能。通过XPS通过核心能级(CL)结合能峰位置测量了带偏移Sr3d,Ti2p,Ni2p和O1s的含量。电流(I)-电压(V)响应中的类似二极管的特征表明,界面受限的肖特基发射是计算出的光学介电常数,STO为4.11,NiO为6.26。对于Si / Pt / STO / Pt和Si / PYSTO / NiO / Pt组件,零偏压时的界面势垒高度都近似于0.30 eV,这表明泄漏电流的减小是由于它的大导通和价带偏移引起的。分别降至2.02和2.17 eV。

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