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Mapping the technological landscape: Measuring technology distance, technological footprints, and technology evolution

机译:绘制技术前景图:测量技术距离,技术足迹和技术演进

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We develop and apply a set of measures that enable a fine-grained characterization of technological capabilities based on the USPTO database. These measures can capture the distance between any two patents, and help to identify outlier patents. They also provide a rich characterization of a firm's technological footprint, including its depth and breadth. The measures also enable researchers to assess the technological overlap, similarity, and proximity of the technological footprints of two or more firms. At the level of the macro technology landscape, the measures can be used to explore such dynamics as technology agglomeration, knowledge spillovers, and technology landscape evolution. We show applications of each of the measures and compare the results obtained with those that would be obtained with previously existing measures of firm diversity, similarity and proximity, highlighting the advantages of the measures used here.
机译:我们开发并应用了一系列措施,这些措施可以基于USPTO数据库对技术能力进行细粒度的表征。这些措施可以捕获任意两个专利之间的距离,并有助于识别异常专利。它们还提供了公司技术足迹的丰富特征,​​包括其深度和广度。这些措施还使研究人员能够评估两个或多个公司的技术重叠,相似性和技术足迹的接近性。在宏观技术格局的层面上,这些措施可用于探索诸如技术集聚,知识溢出和技术格局演进之类的动力。我们展示了每种措施的应用,并将获得的结果与以前存在的企业多样性,相似性和邻近性的措施所获得的结果进行比较,突出了此处使用的措施的优势。

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