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COOLING HOOD FOR RETICLE

机译:掩盖的冷却罩

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The present disclosure describes various aspects of systems, apparatuses, and methods for removing heat from a reticle during the operation of a lithographic apparatus to increase the accuracy with which a projected pattern overlies patterns already present on a substrate. In some aspects, the present disclosure describes a lithographic apparatus. The lithographic apparatus can include an optical system configured to direct a radiation beam onto a reticle supported by a reticle table to form a patterned radiation beam. The radiation beam can cause heating of an exposed area of the reticle. The lithographic apparatus can further include a reticle cooling apparatus configured to remove heat from the reticle. The reticle cooling apparatus can include a cooling element disposed below the reticle and adjacent to the exposed area, The cooling element can include a body that includes a chamber connected to a channel configured to deliver gas to the chamber. A roof of the chamber can be disposed adjacent to the reticle and can include openings configured to output the gas towards the reticle. The reticle cooling apparatus can further include actuators configured to modify a distance between the roof and the reticle. The reticle cooling apparatus can further include a cooling controller configured to generate a cooling control signal based on timing data for a projection of the patterned radiation beam, absorption data for the exposed area on the reticle, and a target heat transfer rate. The cooling control signal can be configured to instruct the reticle cooling apparatus to actuate the actuators to modify the distance between the roof and the reticle. The cooling controller can be further configured to transmit the cooling control signal to the actuators. In some aspects, the present disclosure describes a reticle cooling apparatus. The reticle cooling apparatus can include a cooling element configured to be disposed below a reticle supported by the reticle table and adjacent to an exposed area of the reticle. The cooling element can include a body containing a chamber connected to a channel configured to deliver gas to the chamber. A roof of the chamber can be configured to be disposed adjacent to the reticle and can include openings configured to output the gas towards the reticle. The reticle cooling apparatus can further include actuators configured to modify a distance between the roof and the reticle. The reticle cooling apparatus can further include a cooling controller configured to generate a cooling control signal based on timing data for a projection of a patterned radiation beam generated by the reticle, absorption data for the exposed area on the reticle, and a target heat transfer rate. The cooling control signal can be configured to instruct the reticle cooling apparatus to actuate the actuators to modify the distance between the roof and the reticle. The cooling controller can be further configured to transmit the cooling control signal to the actuators. In some aspects, the present disclosure describes a method for removing heat from a reticle. The method can include generating, by a cooling controller, a cooling control signal based on timing data for a projection of a patterned radiation beam formed by illuminating an exposed area on a reticle supported by a reticle table, absorption data for the exposed area, and a target heat transfer rate. The cooling control signal can instruct a reticle cooling apparatus to actuate actuators to modify a distance between the reticle and a roof of a chamber connected to a channel for delivering gas to the chamber. The channel can be disposed in a body of a cooling element of the reticle cooling apparatus. The method can further include transmitting, by the cooling controller, the cooling control signal to the actuators. The method can further include modifying, by the actuators based on the cooling control signal, the distance between the reticle and the roof to modify a heat transfer rate associated with a removal of heat from the reticle towards the target heat transfer rate. Further features, as well as the structure and operation of various aspects, are described in detail below with reference to the accompanying drawings. It is noted that the disclosure is not limited to the specific aspects described herein. Such aspects are presented herein for illustrative purposes only. Additional aspects will be apparent to persons skilled in the relevant art(s) based on the teachings contained herein.
机译:本公开描述了用于在光刻设备的操作期间从掩模版中移除来自掩模版的热量的系统,装置和方法的各个方面,以提高突出图案覆盖已经存在于基板上的图案的精度。在一些方面,本公开描述了一种光刻设备。光刻设备可以包括光学系统,该光学系统被配置为将辐射束引导到由掩模版台支撑的掩模版上以形成图案化的辐射束。辐射束可以导致掩盖的暴露区域的加热。光刻设备还可包括掩模版冷却装置,其配置成从掩模版中移除热量。掩模版冷却设备可以包括设置在掩模版下方并且与暴露区域相邻的冷却元件,冷却元件可包括主体,该主体包括连接到腔通道的腔室,该腔室被配置为将气体输送到腔室的通道。腔室的屋顶可以与掩模版附近设置,并且可以包括构造成将气体输出朝向掩模版的开口。掩模版冷却装置还可包括致动器,该致动器被配置为改变屋顶和掩模版之间的距离。掩模版冷却设备还可包括冷却控制器,该冷却控制器被配置为基于用于图案化辐射束的投影的定时数据来产生冷却控制信号,该辐射束的曝光区域的吸收数据以及目标传热速率。冷却控制信号可以被配置为指示掩模版冷却装置致动致动器以改变顶部和掩模版之间的距离。冷却控制器还可以被配置为将冷却控制信号传送到致动器。在一些方面,本公开描述了一种掩模版冷却装置。掩模版冷却装置可包括冷却元件,冷却元件构造成被设置在由掩模版台支撑的掩模版下方并且与掩模版的暴露区域相邻。冷却元件可包括包含连接到通道的腔室,该腔室被配置为将气体输送到腔室。腔室的屋顶可以被配置为与掩模版附近设置,并且可以包括构造成向掩模版输出气体的开口。掩模版冷却装置还可包括致动器,该致动器被配置为改变屋顶和掩模版之间的距离。掩模版冷却设备还可包括冷却控制器,冷却控制器被配置为基于由掩模版产生的图案化辐射束的投影的定时数据产生冷却控制信号,掩盖上暴露区域的吸收数据以及目标传热速率。冷却控制信号可以被配置为指示掩模版冷却装置致动致动器以改变顶部和掩模版之间的距离。冷却控制器还可以被配置为将冷却控制信号传送到致动器。在一些方面,本公开描述了一种用于从掩模版中去除热量的方法。该方法可以包括通过冷却控制器产生基于通过照射由掩盖表,曝光区域的掩模版的掩模版上的暴露区域而形成的图案化辐射束的投影的定时数据来产生冷却控制信号。目标传热速率。冷却控制信号可以指示掩模版冷却装置致动致动器以改变连接到连接到腔室的腔室之间的掩模和腔室之间的距离。通道可以设置在掩模版冷却装置的冷却元件的主体中。该方法还可以包括通过冷却控制器向致动器发送冷却控制信号。该方法还可以包括基于冷却控制信号的致动器改变,掩模版和屋顶之间的距离来改变与从掩模版朝向目标传热速率去除热量的传热速率。下面参考附图详细描述进一步的特征,以及各方面的结构和操作。应注意,本公开不限于本文所述的特定方面。这些方面在此呈现出用于说明目的。基于本文所含的教导,对相关技术的人员是显而易见的。

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    《Research Disclosure》 |2021年第688期|2158-2159|共2页
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