The present research disclosure relates to an industrial process and an associated industrial apparatus. The industrial process and apparatus may be used in a semiconductor manufacturing apparatus, for example the lithographic production of integrated circuits. For example, the process and apparatus disclosed herein may he used in a next-generation extreme ultraviolet (EUV) lithographic apparatus. Hydrogen gas is typically used at various points of a semiconductor manufacturing process. Semiconductor manufacturing apparatuses typically comprise equipment, for example radiation sources, illumination optics, wafer stages, which are held under vacuum (especially such apparatuses which use EUV radiation). Hydrogen which is used in the semiconductor manufacturing apparatus is typically vacumized with one or more vacuum pumps. Due to the high-quality nature of semiconductor manufacturing, clean rooms arc commonly used in semiconductor manufacturing facilities. Clean rooms contain conditioned air with very low density of contaminant particles. Such clean rooms may house semiconductor manufacturing apparatuses containing and/or using hydrogen, as well as gas infrastructure such as vacuum pumps, abatement systems, value manifolds and drop points.
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