LITHOGRAPHIC APPARATUS, ASSEMBLY, AND METHOD

摘要

There is described a lithographic apparatus including a membrane assembly and a radiation beam path, wherein the membrane assembly includes a membrane, the membrane being disposed in the radiation beam path, wherein the membrane assembly is configured to selectively move the membrane from a first position in the radiation beam path to a second position in the radiation beam path. Also described is a membrane assembly, a method of extending the lifespan of a membrane, and the use of such apparatuses and methods in a lithographic apparatus or process.