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A GROOVE CERAMIC INSULATOR COMPACT HV FEEDTHROUGH FOR ULTRA-HIGH VACUUM SYSTEM

机译:用于超高真空系统的沟槽陶瓷绝缘体紧凑的HV馈通

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摘要

A lithographic apparatus is a machine that applies a desired pallern onto a substrate, usually onto a portion of the substrate.A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability are under a fast-paced and extensive development.One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as EUV or EUVL), which allows for sub-10 nanometre (nm) scale resolution.In lithographic processes, it is desirable frequently to make measurements of the structures created, e.g., for process control and verification.In order to keep pace with the advancement of lithographic technologies, various inspection and metrology tools have been made available.
机译:光刻设备是一种机器,该机器将所需的缺点施加到基板上,通常在基板的一部分上。一种光刻设备,例如,可以使用例如越来越多的制造需求的集成电路(IC)。驱动现代综合电路与较长的尺寸,可提供更高分辨率和更好可靠性的平版技术在快节奏和广泛的发展中。这种推进的平版技术是极端的超紫色光刻(也称为EUV或EUVL),这允许Sub-10纳米(NM)刻度分辨率。在光刻过程中,期望经常考虑测量创造的结构,例如,用于过程控制和验证。在顺序跟上平化技术的进步,各种检查和计量工具已提供。

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    《Research Disclosure》 |2020年第669期|1-2|共2页
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