Scribelane Focus Mark Measurement for Intra-field Topography Prediction

摘要

Intra-field surface topography on a lithographically patterned substrate is an important parameter for lithography exposures. Due to the limited focus budget, for example in EUV lithography, accurate and precise knowledge of surface topography may be used to improve exposures. As topography variations may be dependent on the pattern layout on the substrate, topographies may vary significantly across an exposure field (intra-field). Described herein are methods for measuring and predicting intra-field topographies on patterned substrates.