Per field model optimization by using tntrafleld model residuals.

摘要

The invention relates to per field modeling, The fingerprint of each individual field is determined based on the data of the metrology points belonging to that single field. Currently in most situations all available metraltjgy targets will be measured for each field (full dense measurement dense data), with Hybrid Metrology method it is however not needed that all available points are measured for each field. Currently per field modeling considers only the data for that single field for doing the fit/estimation. The global model fingerprint (inter- and intrafield) can be subtracted from the metrology data, but model residuals are ignored so far. When not all points are measured for a certain field, then the global intrafield model residuals will manifest itself as a correctable error for that field.