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The effect of annealing on the properties of diamond-like carbon protective antireflection coatings

机译:退火对类金刚石碳防护增透膜性能的影响

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In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. Therefore, as one of the diverse applications, DLC film can be utilized as a protective coating for IR windows and an anti-reflective coating for solar cells. For this study, DLC films were prepared by the radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) method on silicon substrates using methane (CH_4) and hydrogen (H_2) gas. We examined the effects of the post-annealing temperature and the annealing ambient on structural, electrical and optical properties of DLC films. The films were annealed at temperatures ranging from 300 to 900 ℃ in steps of 200 ℃ using rapid thermal annealing equipment in nitrogen ambients. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The variation of structure according to the annealing treatment was examined using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM). The reflectance of DLC thin film was investigated by UV-vis spectrometry and its electrical properties were investigated using a four point probe and Ⅰ- Ⅴ meter. The carrier lifetime of the film was also checked.
机译:类金刚石碳(DLC)膜除了与真正的金刚石膜相似外,还具有许多优势,包括宽带隙和可变折射率。因此,作为多种应用之一,DLC膜可用作红外窗口的保护涂层和太阳能电池的抗反射涂层。对于这项研究,通过射频等离子体增强化学气相沉积(RF-PECVD)方法在硅衬底上使用甲烷(CH_4)和氢气(H_2)气体制备DLC膜。我们研究了退火后温度和退火环境对DLC膜的结构,电学和光学性质的影响。使用快速热退火设备,在氮气环境中,以300到900℃的温度在200℃的范围内对膜进行退火。通过扫描电子显微镜(SEM)和表面轮廓分析来观察膜的厚度。使用拉曼光谱,X射线光电子能谱(XPS)和高分辨率透射电子显微镜(HRTEM)检查了根据退火处理的结构变化。用紫外-可见分光光度法研究了DLC薄膜的反射率,并用四点探针和Ⅰ-Ⅴ计研究了其电性能。还检查了膜的载流子寿命。

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