Measuring the Process Yield for Simple Linear Profiles with one-Sided Specification

摘要

Profile monitoring is mainly for checking the stability of the relationship between response and explanatory variables over time based on observed data. Linear profiles are common in calibration applications. In this study, we develop two new indices for measuring the process yield for simple linear profiles with one-sided specification. The asymptotic distribution of the estimated index is provided. The approximate lower confidence bound for the true process yield is also obtained and used to determine whether the process yield meets the quality requirement. A simulation study is conducted to assess the performance of the proposed method. The results show that the coverage rates of the confidence intervals for all simulated cases are greater than the 95% lower limit of the stated nominal value. One real example is used to illustrate the applicability of the proposed approach.