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"Package Substrate Advancements through Improved Adhesion of Electroless Copper to Dielectrics" Authors: Robin Taylor, Dr. Lutz Brandt, Dr. Zhiming Liu, Craig Rhodine and Tafadzwa Magaya; robin.taylor@atotech.com. Abstract: Fabrication of advanced package substrates is a relatively complex process, requiring numerous pretreatment, cleaning, surface preparation, deposition and rinsing steps. In most cases, metalizing a dielectric surface includes some form of activation or "seeding" process, followed by the autocatalytic (or "electroless") deposition of copper.
机译:“通过改善化学镀铜对电介质的附着力来提高封装基板的性能”作者:Robin Taylor,Lutz Brandt博士,Liu Mingming博士,Craig Rhodine和Tafadzwa Magaya; robin.taylor@atotech.com。摘要:高级封装基板的制造是一个相对复杂的过程,需要大量的预处理,清洁,表面准备,沉积和冲洗步骤。在大多数情况下,金属化介电表面包括某种形式的活化或“播种”过程,然后进行铜的自催化(或“无电”)沉积。

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