首页> 外文期刊>Pramana >6.4 GHz ECR ion source at VECC
【24h】

6.4 GHz ECR ion source at VECC

机译:VECC上的6.4 GHz ECR离子源

获取原文
获取原文并翻译 | 示例
       

摘要

The 6.4 GHz ECR ion source that was indigenously developed a few years ago has been operating continuously for injecting oxygen and neon beams to the cyclotron since 1997. VEC-ECR is a single stage high magnetic field ion source provided with a negatively biased electron repeller placed on the axis, near the injection mirror point. The supply of cold electrons and use of low mass mixing gas improve the stability of ECR plasma. Very recently, the effect of aluminum oxide coating on the copper plasma chamber wall has been studied. The plasma chamber wall was coated with aluminum by vacuum evaporation method and then exposed to oxygen gas to form aluminum oxide. It was noticed that the process substantially shifts the charge state distribution to the higher charge state with an enhancement of ion current by an order of magnitude. With the aluminized plasma chamber, the VEC-ECR can now produce 12μA of O~(7+), 6.5μA of Ar~(12+), 1.5μA of Kr~(20+) and 1.0μA of Xe~(31+).
机译:自1997年以来,本地开发的6.4 GHz ECR离子源自1997年以来一直连续运行,用于向回旋加速器注入氧气和氖气束。VEC-ECR是一种单级高磁场离子源,配有负偏压电子排斥器在轴上,靠近注入镜点。冷电子的供应和低质量混合气体的使用提高了ECR等离子体的稳定性。最近,已经研究了在铜等离子体室壁上的氧化铝涂层的作用。通过真空蒸发法用铝涂覆等离子体室壁,然后暴露于氧气以形成氧化铝。注意到该过程在离子电流增加一个数量级的情况下将电荷状态分布基本上转移到较高的电荷状态。使用镀铝等离子体室,VEC-ECR现在可以产生12μA的O〜(7 +),6.5μA的Ar〜(12 +),1.5μA的Kr〜(20+)和1.0μA的Xe〜(31+ )。

著录项

  • 来源
    《Pramana》 |2002年第5期|p.775-780|共6页
  • 作者单位

    Variable Energy Cyclotron Centre, Department of Atomic Energy, Block-AF, Bidhan Nagar, Kolkata 700 064, India;

  • 收录信息 美国《科学引文索引》(SCI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;
  • 关键词

    ECR ion source; heavy ions;

    机译:ECR离子源;重离子;
  • 入库时间 2022-08-17 23:38:47

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号