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XPS and XAES of polyethylenes aided by line shape analysis: The effect of electron irradiation

机译:线形分析辅助聚乙烯的XPS和XAES:电子辐照的影响

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摘要

X-ray photoelectron spectroscopy (XPS) and X-ray induced Auger electron spectroscopy (XAES) have been used to investigate different polyethylene surfaces, i.e. low density polyethylene (PELD), high density polyethylene (PEHD) and polyethylene of ultra high molecular weight (PEUHMW). The ratio of Csp~2/sp~3 was evaluated from (ⅰ) fitting of XPS C 1s spectra, (ⅱ) the width of XAES C KLL spectra (parameter D) and (ⅲ) line shape analysis by the pattern recognition (PR) method using the fuzzy k-nearest neighbors (fkNN) rule. The proposed approaches investigate: (ⅰ) the differences between various polyethylene surfaces, (ⅱ) their surface changes and degradation due to electron irradiation under various doses and (ⅲ) their stability under electron beam irradiation.rnThe results of proposed approaches, i.e. C 1s fitting, C KLL width evaluation and PR line shape analysis applied to C 1s and C KLL transitions, are qualitatively consistent. The unirradiated polyethylenes indicate nearly Csp~3 hybridizations. Under an electron dose a rapid decrease of Csp~3 is observed, starting at a dose of 100 Cm~(-2). The quantitative differences observed between results obtained from analyses using the C KLL and C 1s spectra, can be explained with a smaller average information depth of C KLL transition. However, quantitative discrepancies between results of various approaches using the same electron transition, i.e. C KLL or C 1s, are smaller. The surface degradation due to X-ray irradiation was negligible in comparison to electron beam irradiation. The PR method was efficient in identifying the polyethylene surfaces under various electron doses. The largest stability under an electron beam is exhibited by the PEUHMW.
机译:X射线光电子能谱(XPS)和X射线感应俄歇电子能谱(XAES)已用于研究不同的聚乙烯表面,即低密度聚乙烯(PELD),高密度聚乙烯(PEHD)和超高分子量聚乙烯( PEUHMW)。通过(ⅰ)XPS C 1s光谱的拟合,(ⅱ)XAES C KLL光谱的宽度(参数D)和(ⅲ)通过模式识别(PR)的线形分析来评估Csp〜2 / sp〜3的比率)方法使用模糊k最近邻(fkNN)规则。拟议方法研究:(ⅰ)各种聚乙烯表面之间的差异,(ⅱ)在各种剂量下由于电子辐照而引起的表面变化和降解,以及(ⅲ)在电子束辐照下的稳定性。拟合,应用于C 1s和C KLL过渡的C KLL宽度评估和PR线形分析在质量上是一致的。未辐照的聚乙烯表明几乎是Csp〜3杂交。在电子剂量下,从100 Cm〜(-2)开始,Csp〜3迅速下降。使用C KLL和C 1s光谱分析获得的结果之间观察到的定量差异可以用较小的C KLL跃迁平均信息深度来解释。但是,使用相同电子跃迁的各种方法(即C KLL或C 1s)的结果之间的定量差异较小。与电子束辐照相比,由于X射线辐照引起的表面降解可以忽略不计。 PR方法可有效识别各种电子剂量下的聚乙烯表面。 PEUHMW在电子束下显示出最大的稳定性。

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  • 来源
    《Polymer Degradation and Stability》 |2009年第10期|1714-1721|共8页
  • 作者单位

    Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224 Warszawa, Poland;

    Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnicka 10, 162 53 Prague 6, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnicka 10, 162 53 Prague 6, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnicka 10, 162 53 Prague 6, Czech Republic;

    Institute of Biocybernetics and Biomedical Engineering, Polish Academy of Sciences, ul. Ksiecia Trojdena, 02-109 Warszawa, Poland Technical University of Lodz, Computer Engineering Department, ul. Stefanowskiego 18/22, 90-924 Lodz, Poland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    polyethylene; XPS; XAES; line shape analysis; C sp~2/sp~3 hybridization; electron beam degradation;

    机译:聚乙烯XPS;XAES;线形分析;C sp〜2 / sp〜3杂交;电子束降解;

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