Effects of Implant Copper Layer on Diamond Film Deposition on Cemented Carbides

摘要

The deposition of high-quality diamond films and their adhesion on cemented car- bides are strongly influenced by the catalytic effect of cobalt under typical deposition conditions. Decreasing Co content on the surface of the cemented carbide is often used for the diamond film Deposition. But the leaching of Co from the WC-Co substrate leading to a mechanical weak sur- Face often causes a poor adhesion.