首页> 外文期刊>Plasma Science & Technology >A New Approach to Plasma CVD of TiO_2 Photocatalyst on γ-Al_2O_3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure
【24h】

A New Approach to Plasma CVD of TiO_2 Photocatalyst on γ-Al_2O_3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

机译:大气压下介质阻挡放电中填充的γ-Al_2O_3球上TiO_2光催化剂的等离子CVD新方法

获取原文
获取原文并翻译 | 示例
       

摘要

A supported TiO_2/γ-Al_2O_3 photocatalyst has been prepared by γ-Al_2O_3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature. The TiO_2/γ-Al_2O_3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.
机译:通过在大气压和室温下通过γ-Al_2O_3颗粒填充的介电势垒放电诱导等离子体CVD制备了负载型TiO_2 /γ-Al_2O_3光催化剂。 TiO_2 /γ-Al_2O_3光催化剂显示出比Degussa P25高的光催化活性,并且比通过热CVD制备的光催化活性高得多。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号