首页> 外文期刊>Plasma processes and polymers >Deposition of Hydrophobic Functional Groups on Wood Surfaces Using Atmospheric-Pressure Dielectric Barrier Discharge in Helium-Hexamethyldisiloxane Gas Mixtures
【24h】

Deposition of Hydrophobic Functional Groups on Wood Surfaces Using Atmospheric-Pressure Dielectric Barrier Discharge in Helium-Hexamethyldisiloxane Gas Mixtures

机译:氦-六甲基二硅氧烷混合气体中大气压介电阻挡放电在木材表面沉积疏水性官能团

获取原文
获取原文并翻译 | 示例
           

摘要

This work examines the functionalization of sugar maple (Acer saccharum) and black spruce (Picea mariana) wood surfaces using an atmospheric-pressure dielectric barrier discharge in He and He/HMDSO (hexamethyldisiloxane) gas mixtures. Wood samples were placed on one of the electrodes and the plasma was sustained by applying a 3.5 kV peak-to-peak voltage at 12 kHz. Analysis of the discharge stability through current-voltage (I-V) characteristics revealed a filamentary behaviour, in sharp contrast with the homogeneous He discharge obtained with a glass sample. Optical emission spectroscopy performed near the wood vicinity revealed strong N_2 and N_2~+ emissions, suggesting that wood outgassing plays an important role in the evolution of the discharge regime. Analysis of the surface wettability through water contact angle (WCA) measurements indicated that freshly sanded wood samples treated in He/HMDSO plasmas became more hydrophobic with WCAs in the 120°-140° range depending on treatment time and wood species. Attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy measurements on samples exposed to He/HMDSO plasmas revealed the deposition of hydrophobic Si(CH_3)_3-O-Si(CH_3)_2, Si(CH_3)_3 and Si(CH_3)_2 functional groups as well as an increase of the CH-to-OH band intensity ratio. For relatively thick coatings, the WCA following natural aging under uncontrolled conditions remained constant at 132° ±3° which highlights the stability of the plasma-deposited thin films, a very promising result for structural and decorative outdoor applications.
机译:这项工作使用He和He / HMDSO(六甲基二硅氧烷)混合气体中的大气压介电势垒放电检查糖枫(Acer saccharum)和黑云杉(Picea mariana)木材表面的功能化。将木材样品放在一个电极上,并通过在12 kHz处施加3.5 kV峰峰值电压来维持等离子体。通过电流-电压(I-V)特性对放电稳定性的分析显示出丝状行为,与玻璃样品获得的均匀He放电形成鲜明对比。在木材附近进行的光发射光谱分析显示强烈的N_2和N_2〜+发射,这表明木材除气在放电状态的演变中起重要作用。通过水接触角(WCA)测量对表面润湿性的分析表明,在He / HMDSO等离子体中处理过的新鲜磨砂木材样品在120°-140°范围内的WCA时变得更加疏水,具体取决于处理时间和木材种类。对暴露于He / HMDSO等离子体的样品进行的衰减全反射傅立叶变换红外(ATR-FTIR)光谱测量显示出疏水性Si(CH_3)_3-O-Si(CH_3)_2,Si(CH_3)_3和Si(CH_3)的沉积_2个官能团以及CH-OH谱带强度比的增加。对于相对较厚的涂层,在不受控制的条件下自然老化后的WCA保持恒定在132°±3°,这突出了等离子体沉积薄膜的稳定性,这对于结构和装饰性室外应用而言是非常有希望的结果。

著录项

  • 来源
    《Plasma processes and polymers》 |2012年第12期|1168-1175|共8页
  • 作者单位

    Departement de Physique, Universite de Montreal, Montreal (Quebec) H3C 3J7, Canada;

    Departement de Physique, Universite de Montreal, Montreal (Quebec) H3C 3J7, Canada;

    Universite de Toulouse, UPS, INPT, LAPLACE, F-31062 Toulouse Cedex 9, France,CNRS, LAPLACE, F-31062 Toulouse Cedex 9, France;

    Universite de Toulouse, UPS, INPT, LAPLACE, F-31062 Toulouse Cedex 9, France,CNRS, LAPLACE, F-31062 Toulouse Cedex 9, France;

    FPInnovations - Division des Produits du Bois, Quebec (Quebec) G1P 4R4, Canada;

    FPInnovations - Division des Produits du Bois, Quebec (Quebec) G1P 4R4, Canada;

    Centre de Recherche sur le Bois, Universite Laval, Quebec (Quebec) G1K 7P4, Canada;

    Plasmionique, Varennes (Quebec) J3X 1S2, Canada;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号