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首页> 外文期刊>Physical review. B, Condensed Matter And Materals Physics >Hybrid k • p tight-binding model for subbands and infrared intersubband optics in few-layer films of transition-metal dichalcogenides: MoS_2, MoSe_2, WS_2, and WSe_2
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Hybrid k • p tight-binding model for subbands and infrared intersubband optics in few-layer films of transition-metal dichalcogenides: MoS_2, MoSe_2, WS_2, and WSe_2

机译:过渡金属二卤化物(MoS_2,MoSe_2,WS_2和WSe_2)的几层膜中的子带和红外子带光学的混合k•p紧密绑定模型

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摘要

We present a density functional theory parametrized hybrid k • p tight-binding model for electronic properties of atomically thin films of transition-metal dichalcogenides, 2H-MX_2 (M = Mo. W; X = S. Se). We use this model to analyze intersubband transitions in p- and n-doped 2H-MX_2 tilms and predict the line shapes of the intersubband excitations, determined by the subband-dependent two-dimensional electron and hole masses, as well as excitation lifetimes due to emission and absorption of optical phonons. We find that the intersubband spectra of atomically thin films of the 2H-MX_2 family with thicknesses of N = 2 to 7 layers densely cover the infrared spectral range of wavelengths between 2 and 30 μm. The detailed analysis presented in this paper shows that for thin n-doped films, the electronic dispersion and spin-valley degeneracy of the lowest-energy subbands oscillate between odd and even number of layers, which may also offer interesting opportunities for quantum Hall effect studies in these systems.
机译:我们为过渡金属二卤化物2H-MX_2(M = Mo. W; X = S. Se)的原子薄膜的电子性质提供了一个密度泛函理论参数化的杂化k•p紧密绑定模型。我们使用该模型来分析p和n掺杂2H-MX_2 tilms中的子带间跃迁,并预测子带间激发的线形,该线形由与子带有关的二维电子和空穴质量确定,以及由于发射和吸收光子。我们发现,厚度为N = 2至7层的2H-MX_2族原子薄膜的子带间光谱密集地覆盖了2至30μm波长的红外光谱范围。本文提供的详细分析表明,对于n掺杂薄膜,最低能量子带的电子色散和自旋谷简并在偶数层和偶数层之间振荡,这也可能为量子霍尔效应研究提供有趣的机会在这些系统中。

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  • 来源
    《Physical review. B, Condensed Matter And Materals Physics》 |2018年第3期|035411.1-035411.20|共20页
  • 作者单位

    National Graphene Institute, University of Manchester, Booth St E, Manchester M13 9PL, United Kingdom;

    National Graphene Institute, University of Manchester, Booth St E, Manchester M13 9PL, United Kingdom;

    National Graphene Institute, University of Manchester, Booth St E, Manchester M13 9PL, United Kingdom;

    National Graphene Institute, University of Manchester, Booth St E, Manchester M13 9PL, United Kingdom;

    National Graphene Institute, University of Manchester, Booth St E, Manchester M13 9PL, United Kingdom;

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