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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >Compensation, interstitial defects, and ferromagnetism in diluted ferromagnetic semiconductors
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Compensation, interstitial defects, and ferromagnetism in diluted ferromagnetic semiconductors

机译:稀铁磁半导体中的补偿,间隙缺陷和铁磁性

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摘要

We present a quantitative theory for ferromagnetism in diluted Ⅲ-Ⅴ ferromagnetic semiconductors in the presence of the two types of defects commonly supposed to be responsible for compensation: As antisites and Mn interstitials. In each case we reduce the description to that of an effective random Heisenberg model with exchange integrals between active magnetic impurities provided by ab, initio calculation. The effective magnetic Hamiltonian is then solved by a semianalytical method (locally self-consistent random-phase approximation), where disorder is treated exactly. Measured Curie temperatures are shown to be inconsistent with the hypothesis that As antisites provide the dominant mechanism for compensation. In contrast, if we assume that Mn interstitials are the main source for compensation, we obtain a very good agreement between the calculated Curie temperature and the measured values, in both as-grown and annealed samples.
机译:我们提出了一种稀薄的Ⅲ-Ⅴ型铁磁半导体中的铁磁性的定量理论,其中存在两种通常被认为是负责补偿的缺陷:作为反位点和Mn间隙。在每种情况下,我们将描述简化为有效的随机Heisenberg模型的描述,该模型由ab,从头算起提供活性磁性杂质之间的交换积分。然后,通过半解析方法(局部自洽随机相位近似)求解有效的磁性哈密顿量,在此方法中,无序现象得到了精确处理。测得的居里温度与As反位点提供补偿的主要机理这一假设不一致。相反,如果我们假设Mn间隙是补偿的主要来源,则在生长和退火的样品中,我们都可以在计算的居里温度和测量值之间获得很好的一致性。

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